System for contact imaging both sides of a substrate
US6198525A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Feb 19, 1999 |
| Grant date | Mar 6, 2001 |
| Priority date | — |
| Expiry date | Feb 19, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K2203/1572
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
Apparatus for contact exposing each side of a substrate to a different image on a mask includes a first-side imaging station for imaging the first side of the substrate, a second-side imaging station for imaging the second side thereof, an intermediate station between the imaging stations for inverting the substrate. In each imaging station, the substrate is moved longitudinally with a transport carriage, from which it is transferred to an imaging carriage to be driven to an imaging point at which illumination through the mask occurs. The imaging carriage moves in both longitudinal and transverse directions, providing for both exposure to a mask covering the substrate and for step-and-repeat exposure of multiple portions of the substrate to a smaller image. Before exposure, the top surface of the substrate is aligned to be parallel to the adjacent mask, fiducial markings in the substrate are aligned with fiducial markings on the mask, and air is evacuated from the area between the mask and the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.