Photodeposition method for fabricating a three-dimensional, patterned polymer microstructure
US6200737A · kind A · utility
185Cited by
10References
3Claims
0Family size
Assignee
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Key dates
| Filing date | Aug 24, 1995 |
| Grant date | Mar 13, 2001 |
| Priority date | — |
| Expiry date | Aug 24, 2015 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/2008
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention is a photodeposition methodology for fabricating a three-dimensional patterned polymer microstructure. A variety of polymeric structures can be fabricated on solid substrates using unitary fiber optic arrays for light delivery. The methodology allows micrometer-scale photopatterning for the fabricated structures using masks substantially larger than the desired dimensions of the microstructure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.