Sputtering device for coating an essentially flat disk-shaped substrate
US6203677A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Sep 28, 1998 |
| Grant date | Mar 20, 2001 |
| Priority date | — |
| Expiry date | Sep 28, 2018 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/34
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A device for coating a disk-like substrate (3,3', . . . ) with the aid of cathodic sputtering, having an essentially cylindrical transport chamber (7) and with a vacuum pump (8) connected to the transport chamber (7) and with an opening (9) that can be closed off by a plate (16) for inserting and removing the substrates (3,3'. . . ) and with a coating chamber (11) containing the cathode (10) and with a substrate carrier (12) seated so as to be able to rotate in the transport chamber (7), the substrate carrier (12) is connected to the output shaft (13) of a motor-gear assembly unit (14) and, on the one hand, can be displaced by the latter inside the transport space (19) from a center operating position (A) in a vertical lifting motion into an upper coating position (B) and a lower rest position (C) and, on the other, can be rotated by the output shaft (13) inside the transport space (19), wherein the suction connector (15) of the vacuum pump (8) on the bottom part (4) of the transport space (19) can closed off by the substrate carrier (12) in the rest position (C).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.