Method for manufacturing thin film actuated mirror array in an optical projection system
US6204080A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Mar 31, 1998 |
| Grant date | Mar 20, 2001 |
| Priority date | — |
| Expiry date | Mar 31, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B26/0858
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for manufacturing a thin film AMA is disclosed. The second sacrificial layer is formed by using amorphous silicon, poly silicon or a material having fluidity and the first sacrificial layer is formed by using amorphous silicon or poly silicon. The light efficiency is enhanced by the reflecting member having an even surface after the first and the second sacrificial layers are formed in order to have even surfaces. In addition, the active matrix, the active layer and the reflecting member have no damages because the second sacrificial layer is removed by using the oxygen plasma or the vapor of bromine fluoride or xenon fluoride and the first sacrificial layer is removed by using the vapor of bromine fluoride or xenon fluoride.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.