Patent · US Expired

Method and evaporation chamber for generating a continuous vapor stream containing a compound having monovalent gallium therein, and a vacuum coating apparatus

US6210755A · kind A · utility

4Cited by

5References

20Claims

0Family size

Assignee

Siemens Aktiengesellschaft · DE

Inventors

Manfred Fuchs · Nuremberg, DE
Erich Hell · Erlangen, DE
Detlef Mattern · Erlangen, DE

Key dates

Filing date	Nov 9, 1999
Grant date	Apr 3, 2001
Priority date	—
Expiry date	Nov 9, 2019

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC23C14/243
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

In a method and evaporation chamber for generating a continuous vapor stream containing a compound in which gallium is present in monovalent form of a vacuum coating method for vacuum coating a substrate, an evaporation substance containing gallium in bivalent or trivalent form, is arranged together with metallic gallium in the evaporation chamber, that is closed on all sides and has a vapor exit opening. The evaporation substance is evaporated, and the vapor is brought into contact with the metallic gallium, causing the bivalent or trivalent gallium to be reduced to monovalent gallium in a vapor stream which subsequently exits in the direction of the substrate via the vapor exit opening.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.