Copolymer for the manufacture of chemical amplified photoresist and a positive photoresist composition using the same
US6210859A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 15, 1999 |
| Grant date | Apr 3, 2001 |
| Priority date | — |
| Expiry date | Oct 15, 2019 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/126
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
This invention relates to a copolymer for the manufacture of chemical amplified photoresist and a chemical amplified positive photoresist composition comprising a copolymer for the manufacture of chemical amplified photoresist as a base resin, as represented by the following formula 1, an acid generator and additive, ##STR1## PA1 Wherein, R.sub.1, R.sub.2, R.sub.3 and R.sub.4 are independently a hydrogen atom or a lower alkyl group; PA1 R.sub.5, R.sub.6, R.sub.7 and R.sub.8 are a hydrogen atom, an alkyl group of C1-8, an alkoxy group, an alkoxycarbonyl group or a halogen atom; PA1 h and i are independently an integer of 0-8; k, l, m and n represent an integer of element units provided that 0.3<k/(k+l+m+n)<0.9, 0.ltoreq.l/(k+l+m+n)<0.6, 0.ltoreq.m/(k+l+m+n)<0.6, and 0.01<n/(k+l+m+n)<0.3, including k+l+m+n=1 and m may not become simultaneously zero, or are not simultaneously zero, PA1 R.sub.9 is a compound represented by the following formula 2: Formula 2 ##STR2## PA1 Wherein, R.sub.10 and R.sub.11 are independently a hydrogen atom, or an alkyl group of C1.about.6 with linear or branched chain; PA1 R.sub.12 is an alkyl group of C1.about.10 with linear, branched chain or cyclic form a…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.