Semiconductor device manufacturing system
US6212789A · kind A · utility
511Cited by
7References
17Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Aug 11, 1998 |
| Grant date | Apr 10, 2001 |
| Priority date | — |
| Expiry date | Aug 11, 2018 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
There is provided a semiconductor device manufacturing system capable of carrying out resist stripping or surface pre-treatment of a substrate by use of a gas such as chlorosulfuric acid with high reactivity The manufacturing system comprises a process vessel 101 formed integrally of a process chamber 1 for treating respective surfaces of substrates 202 with a chemical vapor and a chemical storage chamber 2 for storing chemical for generating the chemical vapor, and a chemical heating means 5 for heating the chemicals stored in the chemical storage chamber 2 to evaporation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.