Focused ion beam formation of angled optoelectronic devices
US6214178A · kind A · utility
10Cited by
3References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 22, 1998 |
| Grant date | Apr 10, 2001 |
| Priority date | — |
| Expiry date | Dec 22, 2018 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S5/1085
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Fabrication of an optoelectronic device is enhanced by using a focused ion beam to prepare one or more of the device's facet surfaces. In particular, a facet may be oriented at a nearly arbitrary angled with respect to the waveguide within the device by controlling the orientation between the focused ion beam source and the device waveguide. Such facets are useful as antireflection and refractive beamsteering surfaces.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.