Nanoporous material fabricated using a dissolvable reagent
US6214746A · kind A · utility
28Cited by
4References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 18, 1999 |
| Grant date | Apr 10, 2001 |
| Priority date | — |
| Expiry date | Oct 18, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01B3/30
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Nanoporous low dielectric constant materials are fabricated from a first reagent and a second reagent. The reagents are mixed to give a reagent mixture and a polymeric structure is formed from the reagent mixture. Nanosized voids are created by removing at least in part the second reagent from the polymeric structure by a method other than thermolysis, and other than evaporation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.