Coated platen design for plasma immersion ion implantation
US6217724A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 18, 1998 |
| Grant date | Apr 17, 2001 |
| Priority date | — |
| Expiry date | Dec 18, 2018 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32559
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A plasma treatment system (200) for implantation with a novel susceptor with a silicon coating (203). The system (200) has a variety of elements such as a chamber, which can have a silicon coating formed thereon, in which a plasma is generated in the chamber. The system (200) also has a susceptor disposed in the chamber to support a silicon substrate. The silicon coating reduces non-silicon impurities that may attach to the silicon substrate. In a specific embodiment, the chamber has a plurality of substantially planar rf transparent windows (26) on a surface of the chamber. The system (200) also has an rf generator (66) and at least two rf sources in other embodiments.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.