Moisture-resistant barrier material based on copolyamide PA-6, I/6, T/6, 6 and/or PA-6, I/6, T which is capable of being processed by drawing and/or thermoforming
US6217962A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Jan 20, 1998 |
| Grant date | Apr 17, 2001 |
| Priority date | — |
| Expiry date | Jan 20, 2018 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31725
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
The present invention relates to materials which are barriers to gases and to liquids, which are resistant to water and which are capable of being shaped into single- or multimaterial thin layers or films which can be processed by drawing and/or thermoforming. These barrier materials are based on copolyamide composed essentially of units derived from hexamethylenediamine, iso- and terephthalic acids and optionally adipic acid. They can be used for the manufacture of composite materials comprising one or more thin layers, sheets and/or films, pipes or hollow bodies intended in particular for the packaging of chemicals, foodstuffs or pharmaceutical and/or cosmetic products.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.