Lithographic process having sub-wavelength resolution
US6218057A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Apr 16, 1999 |
| Grant date | Apr 17, 2001 |
| Priority date | — |
| Expiry date | Apr 16, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0035
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic process for making an article such as a semiconductor device or a lithographic mask is disclosed. In the process, articles are fabricated by a sequence of steps in which materials are deposited on a substrate and patterned. These patterned layers are used to form devices on the semiconductor substrate. The desired pattern is formed by introducing an image of a first pattern in a layer of energy sensitive material. The image is then developed to form a first pattern. A layer of energy sensitive material is then formed over the first pattern. An image of a second pattern is then formed in the layer of energy sensitive material formed over the first pattern. The second pattern is then developed. The desired pattern is then developed from the first pattern and the second pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.