Method of manufacturing an integrated circuit using a scanning system and a scanning system
US6218077A · kind A · utility
14Cited by
0References
12Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Oct 26, 1998 |
| Grant date | Apr 17, 2001 |
| Priority date | — |
| Expiry date | Oct 26, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70358
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of manufacturing an integrated circuit using an imaging system having a mask and an energy source that produces an exposure field. A substrate is moved across the exposure field while changing the depth of focus of the imaging system relative to the substrate. The depth of focus may be changed by moving the substrate, the mask, or both, relative to each other changes the depth of focus. The depth of focus may be oscillated according to a periodic waveform where the waveform is equal to the time for a typical point on the substrate to pass through the exposure field.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.