Patent · US Expired

Method of fabricating a thinned CCD

US6218211A · kind A · utility

1Cited by
12References
14Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 31, 2000
Grant dateApr 17, 2001
Priority date
Expiry dateMar 31, 2020

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10F39/80

Abstract

An integrated circuit device structure comprises a semiconductor plateau containing an active region subjacent its front side, an electrode structure at the front side of the plateau, and an insulating layer surrounding the semiconductor plateau. A front side bus at the front side of the insulating layer is connected to the electrode structure. The front side bus extends over an elongate aperture in the insulating layer and is connected through the aperture to a back side bus over substantially the entire length of the front side bus.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.