Patent · US Expired

Copolyester containing isophthalic acid, 1,4-cyclohexanedimethanol, 4,4'-biphenyldicarboxylic acid and an ultraviolet light absorbing compound and articles made therefrom

US6218450A · kind A · utility

11Cited by
9References
25Claims
0Family size

Assignee

Inventor

Key dates

Filing dateDec 13, 1999
Grant dateApr 17, 2001
Priority date
Expiry dateDec 13, 2019

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC08K5/34
  • WIPO fieldMacromolecular chemistry, polymers
  • WIPO sectorChemistry

Abstract

A copolyester blend resistant to ultraviolet radiation includes a polyethylene terephthalate based copolyester having 1,4-cyclohexanedimethanol residues; an effective amount of an ultraviolet radiation absorber selected from the group consisting of benzoxazinones, dimeric benzotriazoles, triazines and mixtures thereof; from about 5 mol % to about 40 mol % isophthalic acid residues in the copolyester, and from 5 mol % to 20 mol % 4,4'-biphenyldicarboxylic acid residues present in the copolyester, wherein the mole percent of the diacid is based on 100 mole percent of dicarboxylic acid or equivalents. The copolyester blend is useful in making UV radiation resistant thermoformed articles.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.