Method for automating manufacture of photomask
US6221538A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 2, 1998 |
| Grant date | Apr 24, 2001 |
| Priority date | — |
| Expiry date | Mar 2, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG05B2219/32315
- WIPO fieldControl
- WIPO sectorInstruments
Abstract
A computer system (10) and method for automating manufacture of a photomask. The computer system (10) has a product database (21) that stores information used to manufacture the photomask. In addition, a semiconductor device is manufactured using the information stored in the product database (21). The information is transmitted to the product database (21) from semiconductor satellite systems such as a fabrication facility (14), a first mask shop (12), and a second mask shop (13). The computer system (10) chooses a mask shop for producing the photomask by using the information transmitted form the first mask shop (12) and the second mask shop (13).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.