Optical waveguide photosensitization
US6221566A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Feb 18, 1999 |
| Grant date | Apr 24, 2001 |
| Priority date | — |
| Expiry date | Feb 18, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0042
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention is directed to a method of enhancing the photosensitivity of an optical waveguide and an optical waveguide having persistent UV photosensitivity following out diffusion of a loading gas such as H.sub.2 or D.sub.2. The optical waveguide is loaded with a gas such as H.sub.2 or D.sub.2 to form an associated baseline refractive index. At least a portion of the loaded optical waveguide is exposed to UV radiation to induce a change in the baseline refractive index and the waveguide is annealed to diffuse the gas from the loaded optical waveguide and to stabilize the change in refractive index. Following annealing the optical waveguide retains a UV photosensitivity sufficient to produce significant refractive index changes relative to the induced change in baseline refractive index. The method of the present invention is particularly well suited for designing and fabricating grating devices, tuning grating strength and wavelength, and for providing accurate spatial control of waveguide photosensitivity. Waveguides having complex photosensitivity profiles as a function of length are also disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.