Process and apparatus for refining silicon
US6231826A · kind A · utility
12Cited by
8References
3Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 8, 1999 |
| Grant date | May 15, 2001 |
| Priority date | — |
| Expiry date | Sep 8, 2019 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC01B33/037
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
Process and apparatus for refining silicon by treatment in a graphite vessel with irradiation with an electron beam while removing impurity elements by evaporation. A single graphite vessel is used, or plural graphite vessels are arranged in sequence. During treatment in successive graphite vessels, molten silicon is poured in succession from one vessel to another. Use of graphite vessels improves heat efficiency, prevents contamination and produces refined silicon containing very low contents of impurities.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.