Low temperature electron beam polymerization
US6232365A · kind A · utility
24Cited by
13References
23Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 17, 1998 |
| Grant date | May 15, 2001 |
| Priority date | — |
| Expiry date | Jul 17, 2018 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC09J4/00
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A method for polymerizing a free-radical initiated adhesive syrup of an C.sub.8-13 alkyl acrylate monomer, optionally including one or more comonomers, by irradiating the adhesive syrup with about 20 to 100 kGy of accelerated electrons over a residence time of greater than 1 second at a temperature below 20.degree. C. The method produces a pressure-sensitive adhesive with balanced peel adhesion, shear strength and conversion.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.