Exposure apparatus with setting of stage driving in accordance with type of motion of stage and device manufacturing method
US6233040A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Jun 18, 1998 |
| Grant date | May 15, 2001 |
| Priority date | — |
| Expiry date | Jun 18, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70725
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In order to obtain a high throughput without degrading superposition alignment, an exposure device for performing exposure to a substrate on a substrate stage while moving and positioning the substrate stage includes a setting unit which can set the value of a drive parameter for driving the substrate stage as different values depending on the types of movement of the substrate stage. The setting unit can set the value of the drive parameter in movement to alignment measurement shots, the value of the drive parameter in scanning exposure, the value of the drive parameter in another movement, and the like as values which are different from each other, and sets the highest velocity or/and the maximum acceleration in movement to alignment measurement shots to be lower than the highest velocity or/and the maximum acceleration in another movement.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.