Source for thermal physical vapor deposition of organic electroluminescent layers
US6237529A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Mar 3, 2000 |
| Grant date | May 29, 2001 |
| Priority date | — |
| Expiry date | Mar 3, 2020 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K71/164
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A thermal physical vapor deposition electroluminescent source includes a housing defining an enclosure having side walls and a bottom wall, the enclosure receiving solid organic electroluminescent material which can be vaporized, and the width of the housing having a dimension w.sub.h ; and the housing has a conductive portion defining a vapor efflux aperture slit having a width w.sub.s for permitting vaporized electroluminescent materials to pass through the slit onto a surface of a substrate. A conductive baffle member has width b, the baffle member being centered on the slit and spaced from the side walls and spaced from the top plate by a distance m, the baffle member substantially providing a line-of-sight covering of the slit preventing direct access of vaporized electroluminescent materials to the slit, and preventing particulate electroluminescent materials from passing through the slit; and a straight-line projection from an edge of the slit to an edge of the baffle member onto a side wall defining a position on the side wall such that such position is spaced from the top plate by a dimension L. The ratio of the dimensions w.sub.h to w.sub.s is in a range of from 1.5 to 6.…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.