Apparatus for projecting electromagnetic radiation with a tailored intensity distribution
US6238077A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Sep 16, 1999 |
| Grant date | May 29, 2001 |
| Priority date | — |
| Expiry date | Sep 16, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01S17/66
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The optical system of the present invention efficiently projects electromagnetic radiation such as visible light over a predetermined field of illumination with a tailored intensity distribution. The system includes a base having an optical area that faces the area to be illuminated. The apparatus further includes a mask spaced over the optical area of the base. The system also includes a cavity with an aperture, formed in either the optical area of the base or in a surface of the mask facing toward the base. The base and mask are arranged so that the mask constructively occludes the optical area of the base and/or the aperture of the cavity, with respect to the field of illumination. The system further includes a baffle. The baffle may be between the mask and the base. The baffle may extend into or be within the cavity. The base, the mask, and the baffle have outer surfaces that are reflective, and preferably exhibit a significant diffuse, reflective characteristic. A source emits electromagnetic radiation (e.g., visible light) into the cavity, and the base, mask and baffle redirect this radiation, for illumination of the intended footprint with the tailored intensity distribution…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.