Patent · US Expired

Process for purifying a cryogenic fluid containing N2O, CnHm and/or NOx impurities

US6244071A · kind A · utility

1Cited by
4References
17Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 20, 1999
Grant dateJun 12, 2001
Priority date
Expiry dateOct 20, 2019

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02P20/151
  • WIPO fieldChemical engineering
  • WIPO sectorChemistry

Abstract

A process for purifying a cryogenic fluid, especially argon, helium or oxygen, containing N.sub.2 O, C.sub.n H.sub.m or NO.sub.x impurities, in which the impurities are removed by bringing the cryogenic fluid to be purified into contact with particles of an adsorbent having an average size of less than or equal to 1.5 mm, preferably from 0.8 mm to 1.1 mm. A purified cryogenic fluid is then recovered which contains less than 100 ppb of impurities, preferably less than 10 ppb of impurities. This process can be used for producing ultrapure gases intended especially for the electronics field.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.