Patent · US Expired

Method and apparatus for pad removal and replacement

US6244941A · kind A · utility

34Cited by
8References
2Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 30, 1999
Grant dateJun 12, 2001
Priority date
Expiry dateMar 30, 2019

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB24D9/08
  • WIPO fieldMachine tools
  • WIPO sectorMechanical engineering

Abstract

A method and apparatus for facilitating the removal and replacement of polishing pads utilized in the process of polishing and planarizing workpieces such as semiconductors where the polishing machine employed includes a rotatable platen. The apparatus for facilitating the removal and replacement of polishing pads includes a top plate for securing a polishing pad thereto and means for removably mounting the top plate to the rotatable platen in the polishing machine. Means for removably mounting the top plate to the rotatable platen preferably includes a plurality of electromagnetic elements embedded within the top surface of the rotatable platen and means for activating and deactivating the electromagnetic elements.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.