Zirconia-containing transparent and conducting oxides
US6246071A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Sep 23, 1999 |
| Grant date | Jun 12, 2001 |
| Priority date | — |
| Expiry date | Sep 23, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D62/862
Abstract
This invention pertains to a device of a substrate and a ZrO.sub.2 -based semiconductor disposed thereon and a method for depositing the semiconductor on the substrate. The semiconductor is typically in the form of a film of 1-20 weight % ZrO.sub.2 and 99-80 weight % In.sub.2 O.sub.3 or SnO.sub.2 . The semiconductor is tunable in terms of optical transmission and electrical conductivity. Its transmission is in excess of about 80% over the wavelength range of 400-900 nm and its resistivity is from about 1.3.times.10.sup.-3 .OMEGA.-cm to about 6.5.times.10.sup.-2 .OMEGA.-cm. The deposition method is characterized by depositing in a chamber the semiconductor on a substrate by means of a physical vapor deposition whole maintaining a small oxygen pressure in the chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.