Method of depositing a silicon oxide coating on glass and the coated glass
US6248397A · kind A · utility
66Cited by
5References
9Claims
0Family size
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Inventor
Key dates
| Filing date | Nov 3, 1998 |
| Grant date | Jun 19, 2001 |
| Priority date | — |
| Expiry date | Nov 3, 2018 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03C2218/152
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A method of depositing a silicon oxide coating on hot glass at a temperature below 600.degree. C. comprising contacting the hot glass with a gaseous mixture of a source of silicon and oxygen enriched with ozone. Preferably, the hot glass in the form of a hot glass ribbon is contacted with the gaseous mixture during the float glass production process downstream of the float bath. Preferred sources of silicon are silanes, alkylsilanes, alkoxysilanes and siloxanes.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.