Aqueous developing solutions for reduced developer residue

US6248506A · kind A · utility

Assignee

• Nichigo-Morton Co., Ltd. · JP

Inventors

• Daniel E. Lundy · Placentia, US
• Robert K. Barr · Shrewsbury, US

Key dates

• Filing date: Dec 4, 1998
• Grant date: Jun 19, 2001
• Expiry date: Dec 4, 2018

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/0325
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

An alkaline aqueous developing solution for developing photoresists or the like contains, as an anti-scum agent: PA0 A) between about 0.05 and about 1.0 wt % of a first surfactant or surfactant mixture, the first surfactant(s) having the general formula: EQU R--O--(AO).sub.n --H where AO are alkylene oxide units selected from ethylene oxide units (CH.sub.2 --CH.sub.2 --O) and propylene oxide units (CH(CH.sub.3)--CH.sub.2 --O) or (CH.sub.2 --CH(CH.sub.3)--O) and mixtures of ethylene and propylene oxide units, either in the mixture of molecules, where R is a hydrophobic group, n is between about 8 and about 200, and PA0 B) as a second surfactant, between about 0.05 and 1.0 wt % of an organic salt having the formula: ##STR1## where R is an alkyl or aryl group, preferably phenyl, PA1 A is selected from carboxyl, sulfonyl, phosphonyl and mixtures thereof, preferably sulfonyl. PA1 M is a charge-balancing cation, and PA1 n is between 1 and about 200, preferably between 2 and about 100. the weight ratio of A) to B) being between about 1:5 and about 5:1.