Lateral shearing interferometer system with masked interference pattern
US6249352A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Sep 30, 1999 |
| Grant date | Jun 19, 2001 |
| Priority date | — |
| Expiry date | Sep 30, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01J9/0215
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An improved lateral shearing interferometer system for use with an original optical wavefront and a displaced optical wavefront having a phase difference from the original optical wavefront is disclosed. It comprises a lateral shearing interferometer that responds to the original optical wavefront and the displaced optical wavefront and develops an optical interference pattern representative of the optical phase differences. An optical detector located at the focal plane of the optical interference pattern provides a selective array of electrical signals representative of separated portions of the interference pattern. A data processor is programmed to indicate the separated portions of said interference pattern, which has pixels in non-adjacent locations in odd rows and no pixels in even rows. The pixels correspond to locations of actuators for correcting the phase difference.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.