Ultrasonic photoresist process monitor and method
US6250161A · kind A · utility
3Cited by
12References
4Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 16, 1998 |
| Grant date | Jun 26, 2001 |
| Priority date | — |
| Expiry date | Jul 16, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2291/048
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
There is provided a monitor and method for monitoring the condition of a photoresist film on a wafer in which the phase of high frequency ultrasonic pulses reflected from the wafer/photoresist interface provides an indication of the condition of the photoresist film.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.