Precious metal deposition composition and process
US6251249A · kind A · utility
25Cited by
5References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 13, 1999 |
| Grant date | Jun 26, 2001 |
| Priority date | — |
| Expiry date | Jul 13, 2019 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC25D3/52
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Formulations and procedures for the deposition of precious metals onto solid substrates are disclosed wherein the formulations are iodide-free and contain an organosulfur compound and/or a carboxylic acid and a source of soluble precious metal ion which is one or more precious metal alkanesulfonates, precious metal alkanesulfonamides and/or precious metal alkanesulfonimides. The formulations and processes may be cyanide-free, and the deposition may be effected by electrolytic, electroless and/or immersion plating techniques.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.