Lamp system for uniform semiconductor wafer heating
US6252203A · kind A · utility
6Cited by
4References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 25, 1999 |
| Grant date | Jun 26, 2001 |
| Priority date | — |
| Expiry date | Oct 25, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03B21/2026
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A lamp system with a very soft high-intensity output is provided over a large area by water cooling a long-arc lamp inside a diffuse reflector of polytetrafluorethylene (PTFE) and titanium dioxide (TiO.sub.2) white pigment. The water is kept clean and pure by a one micron particulate filter and an activated charcoal/ultraviolet irradiation system that circulates and de-ionizes and biologically sterilizes the coolant water at all times, even when the long-arc lamp is off.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.