Quality control plasma monitor for laser shock processing
US6254703A · kind A · utility
18Cited by
5References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 19, 1999 |
| Grant date | Jul 3, 2001 |
| Priority date | — |
| Expiry date | Feb 19, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2291/0426
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method and apparatus for quality control of laser shock processing. The method includes measuring emissions and characteristics of a workpiece when subjected to a pulse of coherent energy from a laser. These empirically measured emissions and characteristics of the workpiece are correlated to theoretical shock pressure, residual stress profile, or fatigue life of the workpiece. The apparatus may include a radiometer or acoustic detection device for measuring these characteristics.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.