Method for applying a barrier layer to a silicon based substrate
US6254935A · kind A · utility
34Cited by
6References
26Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 15, 1999 |
| Grant date | Jul 3, 2001 |
| Priority date | — |
| Expiry date | Apr 15, 2019 |
Classification
- Technology area (CPC F)Mechanical Engineering; Lighting; Heating
- CPC primaryF05D2300/611
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A method for applying a barrier layer which comprises a barium-strontium aluminosilicate to a silicon containing substrate which inhibits the formation of cracks.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.