Antimutagenic compositions for treatment and prevention of photodamage to skin
US6255290A · kind A · utility
5Cited by
5References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 3, 1998 |
| Grant date | Jul 3, 2001 |
| Priority date | — |
| Expiry date | Nov 3, 2018 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA61Q19/08
- WIPO fieldPharmaceuticals
- WIPO sectorChemistry
Abstract
A method of improving DNA repair and reducing DNA damage and for reducing mutation frequency in skin for the purpose of reducing consequences of exposure to solar or ultraviolet radiation is disclosed. The methods comprise administering to the skin a composition containing deoxyribonucleosides in concentrations sufficient to enhance DNA repair or reduce mutation frequency in a vehicle capable of delivering effective amounts of deoxyribonucleosides to the necessary skin cells.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.