Combined enhanced shock load capability and stress isolation structure for an improved performance silicon micro-machined accelerometer
US6257060A · kind A · utility
13Cited by
5References
24Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 2, 1999 |
| Grant date | Jul 10, 2001 |
| Priority date | — |
| Expiry date | Nov 2, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01P2015/0828
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The present invention provides an acceleration sensor and an accelerometer having isolation structure formed using a bulk straight wall deep reactive ion etch process, whereby external stress sources are isolated from active accelerometer components.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.