Process for aligning work and mask
US6258495A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Sep 13, 1999 |
| Grant date | Jul 10, 2001 |
| Priority date | — |
| Expiry date | Sep 13, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/00
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A mechanism for aligning a work and a mask, which comprising a camera which picks up an image of a mask mark for aligning a mask having a pattern and an image of a work mark of a work, a control mechanism which recognizes, memorizes, and control the positions of both marks, and, a moving means for moving the work or the mask based on the control signal from the control mechanism to align the shear in the positions of both marks, and which aligns one mark within another mark of both marks, is disclosed. In the case where said one mark to be aligned cannot be recognized, the positions of both marks which have been recognized and memorized at the previous operation are used as pseudo standard, and the amount of the shear in the positions of both marks is carried out to operate the alignment.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.