Method of producing semiconductor thin film and method of producing solar cell using same
US6258666A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jun 15, 1999 |
| Grant date | Jul 10, 2001 |
| Priority date | — |
| Expiry date | Jun 15, 2019 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T156/1978
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Provided is a method of producing a semiconductor thin film wherein while a semiconductor thin film formed on a substrate is supported on a curved surface of a support member having the curved surface, the support member is rotated, thereby peeling the semiconductor thin film away from the substrate. Also provided is a method of producing a semiconductor thin film having the step of peeling a semiconductor thin film formed on a substrate away from the substrate, wherein the peeling step is carried out after the substrate is secured on a substrate support member without an adhesive. These provide the method of peeling the semiconductor thin film away from the substrate without damage and the method of holding the substrate without contamination.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.