Photoresist compositions for ink jet printheads
US6260949A · kind A · utility
22Cited by
8References
21Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 9, 2000 |
| Grant date | Jul 17, 2001 |
| Priority date | — |
| Expiry date | Jun 9, 2020 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08L63/00
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
Disclosed is a composition comprising a blend of (a) a thermally reactive polymer selected from the group consisting of resoles, novolacs, thermally reactive polyarylene ethers, and mixtures thereof; and (b) a photoreactive epoxy resin that is photoreactive in the absence of a photocationic initiator.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.