Ink jet print head formed through anisotropic wet and dry etching
US6260960A · kind A · utility
9Cited by
9References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 24, 1997 |
| Grant date | Jul 17, 2001 |
| Priority date | — |
| Expiry date | Oct 24, 2017 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB41J2002/14411
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
An ink jet print head includes PZT films formed on a first surface of a single-crystal silicon substrate, ink cavities formed in the regions of the single-crystal silicon substrate which correspond in position to the PZT films, and a nozzle plate formed on a second surface of the single-crystal silicon substrate, which is opposite to the first surface. Each ink cavity is formed using anisotropical wet and dry etching, and wherein a portion of each ink cavity close to the first surface of the single-crystal silicon substrate is anisotropically dry etched.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.