Rapid prototyping apparatus with enhanced thermal and/or vibrational stability for production of three dimensional objects
US6261077A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Feb 8, 1999 |
| Grant date | Jul 17, 2001 |
| Priority date | — |
| Expiry date | Feb 8, 2019 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB29K2995/0073
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
A rapid prototyping and manufacturing (e.g. stereolithography) apparatus includes a secondary frame located within a primary frame of the system. The secondary frame defines an enclosure for housing a number of peripheral heat-producing components and peripheral vibration-producing components. The heat generated by these peripheral heat-producing components is substantially isolated in the enclosure and is removed from the primary frame so as not to cause an undesired impact on other components within the main frame. The secondary frame preferably sits directly on the floor or other surface without touching the primary frame, thus substantially avoiding transmittance of vibration from components in the enclosure to the primary frame of the system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.