Apparatus and method for the enhanced imagewise exposure of a photosensitive material
US6262825A · kind A · utility
Assignees
Inventors
Key dates
| Filing date | Aug 24, 1999 |
| Grant date | Jul 17, 2001 |
| Priority date | — |
| Expiry date | Aug 24, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH04N1/0635
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
In accordance with the present invention, there are provided apparatus and methods useful for efficiently subjecting photosensitive materials to a relatively low energy pre-exposure using the electromagnetic energy during the non-imaging portion of the exposure process (i.e., a backscan beam exposure) prior to subjecting such materials to the main imaging exposure (i.e., an imagewise exposure). In a further aspect of the present invention, there are provided combinations and improvements useful for the enhanced imagewise exposure of photosensitive materials. In additional aspects of the present invention, there are provided methods of enhancing the imagewise exposure of photosensitive materials, imagewise exposed photosensitive material made according to such methods, methods for enhancing sensitivity of a photosensitive material for imagewise exposure, and photosensitive materials having enhanced sensitivity for imagewise exposure made according to these methods.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.