Alicyclic dissolution inhibitors and positive potoresist composition containing the same
US6265131A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Apr 3, 2000 |
| Grant date | Jul 24, 2001 |
| Priority date | — |
| Expiry date | Apr 3, 2020 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/109
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A positive photoresist composition comprising a polymer, a photoactived agent and an dissolution inhibitor represented by the following formula (1): ##STR1## wherein R.sub.1 and R.sub.2 each independently is a hydroxyl group, a C.sub.1-8 hydroxyalkyl group, or a C.sub.3-8 hydroxycycloalkyl group; R.sub.3, R.sub.4 and R.sub.5 each independently is a hydrogen, a C.sub.1-8 hydroxyalkyl group, a C.sub.1-6 carboxylic acid or a C.sub.3-8 carboxylic acid ester; k is an integer of 0, 1, 2, 3, 4, 5 or 6. The photoresist composition has high transparency to deep UV light and is capable of forming good fine patterns, roughness and high sensitivity, thus being useful as a chemically amplified type resist when exposed to deep UV light from an KrF and ArF excimer laser.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.