Subresolution grating for attenuated phase shifting mask fabrication
US6268091A · kind A · utility
7Cited by
40References
22Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Mar 28, 2000 |
| Grant date | Jul 31, 2001 |
| Priority date | — |
| Expiry date | Mar 28, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/32
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A subresolution grating composed of approximately circular contacts is fabricated around the border of the primary pattern of a photomask. As a result, resolution at the edges of the photomask pattern is improved when the pattern is printed on a wafer surface. In addition, the reduced leakage enables a more efficient use of the glass plate on which the photomask is fabricated as well as a more efficient use of the wafer surface as a result of being able to place patterns closer together.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.