Patent · US Expired

Electronic structure comprising high and low voltage transistors, and a corresponding fabrication method

US6268633A · kind A · utility

10Cited by
9References
17Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 28, 1998
Grant dateJul 31, 2001
Priority date
Expiry dateDec 28, 2018

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10B41/49

Abstract

A structure of electronic devices integrated in a semiconductor substrate with a first type of conductivity comprising at least a first HV transistor and at least a second LV transistor, each having a corresponding gate region. Said first HV transistor has lightly doped drain and source regions with a second type of conductivity, and said second LV transistor has respective drain and source regions with the second type of conductivity, each including a lightly doped portion adjacent to the respective gate region and a second portion which is more heavily doped and comprises a silicide layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.