Electronic structure comprising high and low voltage transistors, and a corresponding fabrication method
US6268633A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 28, 1998 |
| Grant date | Jul 31, 2001 |
| Priority date | — |
| Expiry date | Dec 28, 2018 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10B41/49
Abstract
A structure of electronic devices integrated in a semiconductor substrate with a first type of conductivity comprising at least a first HV transistor and at least a second LV transistor, each having a corresponding gate region. Said first HV transistor has lightly doped drain and source regions with a second type of conductivity, and said second LV transistor has respective drain and source regions with the second type of conductivity, each including a lightly doped portion adjacent to the respective gate region and a second portion which is more heavily doped and comprises a silicide layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.