Method to improve dip coating
US6270850A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jun 10, 1999 |
| Grant date | Aug 7, 2001 |
| Priority date | — |
| Expiry date | Jun 10, 2019 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB05D1/18
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method for improving the quality of a dip coated layer that is deposited by flowing a solution along a substrate in a gap between the substrate and a wall, including: (a) determining a yield stress, a viscosity, a density, and a surface tension of the solution, and selecting a wet thickness of the coated layer; (b) determining a coating speed based on the determined viscosity, the determined density, the determined surface tension of the solution, and the selected wet layer thickness; and (c) selecting a distance for the gap and calculating the shear stress of the solution in the gap based on the gap distance, wherein the shear stress is greater than the yield stress.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.