Non-lithographic process for producing nanoscale features on a substrate
US6270946A · kind A · utility
75Cited by
5References
42Claims
0Family size
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Key dates
| Filing date | Feb 10, 2000 |
| Grant date | Aug 7, 2001 |
| Priority date | — |
| Expiry date | Feb 10, 2020 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S977/89
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A non-lithographic process for producing nanoscale features on a substrate is presented. The process involves applying to and reacting a first difunctional molecule with the surface of a substrate. A second difunctional molecule is applied and reacted with unreacted functional groups from the first difunctional molecule to form a patterned layer on the surface of a substrate. Selective application of the difunctional molecules is accomplished by using a nanoscale delivery device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.