Photosensitive monomer
US6271412A · kind A · utility
5Cited by
3References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 30, 2000 |
| Grant date | Aug 7, 2001 |
| Priority date | — |
| Expiry date | Jun 30, 2020 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31507
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
This invention provides a compound of the formula (I): ##STR1## PA1 wherein R is hydrogen or C.sub.1 -C.sub.4 alkyl group; R' is C.sub.1 -C.sub.4 alkyl group; n is an integer of 2, 3, 4, 5 or 6. The compound of formula (I) can be polymerized or copolymerized to form a photosensitive polymer or copolymer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.