Objective measurement and correction of optical systems using wavefront analysis
US6271914A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Sep 14, 2000 |
| Grant date | Aug 7, 2001 |
| Priority date | — |
| Expiry date | Sep 14, 2020 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA61F2009/0088
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
Vision in an eye is corrected using an energy source for generating a beam of optical radiation and focusing optics disposed in the path of the beam for directing the beam through the eye, where the beam is reflected back from the retina of the eye as a wavefront of radiation to be measured. An optical correction based on an optical path difference between the measured wavefront and a desired plane wave, and refractive indices of the media through which the wavefront passes is provided to a laser delivery system with a laser beam sufficient for ablating corneal material from the cornea of the eye. The laser beam is directed at selected locations on the cornea for ablating the corneal material in response to the optical correction to cause the measured wavefront to approximate the desired plane wave, and thus provide an optical correction.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.