System for manufacturing a semiconductor device
US6273954A · kind A · utility
27Cited by
14References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 26, 1999 |
| Grant date | Aug 14, 2001 |
| Priority date | — |
| Expiry date | Feb 26, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67017
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A gas supply system for supplying a gas into a reaction chamber is provided with a pulse valve, a mass flow controller and a back pressure controller. The mass flow controller includes a flow meter and a variable flow control valve, and the back pressure controller includes a pressure gauge and a pressure control valve. The pulse valve, the mass flow controller and the back pressure controller are connected to a controller so that operations thereof are controlled by this controller.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.