Apparatus for plasma ion trimming of frequency devices
US6273991A · kind A · utility
0Cited by
8References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 28, 1999 |
| Grant date | Aug 14, 2001 |
| Priority date | — |
| Expiry date | Jul 28, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3053
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A system for simultaneous frequency trimming of a plurality frequency devices such as oscillators, crystals and surface acoustic wave filters and resonators by removing intrinsic or previously deposited material through plasma ion bombardment is comprised of a plasma ion chamber, a magazine rack, a vacuum evacuator, a control console, a plasma power supply and a frequency evaluator. The system employs a shutter assembly and shutter control mechanism to individually regulate plasma ion bombardment of a plurality of frequency devices.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.